Yokohama, Japan, Nov 17, 2014 - (ACN Newswire) - ULVAC-RIKO, Inc. (Head office: Yokohama, Kanagawa, Japan; President and CEO: Narishi Gonohe) has developed a new ultra-high temperature annealing system, "High Temperature Rapid Thermal Annealing System HT-RTA59HD" with high-power spot focused infrared gold image furnace on-board, which can heat precious materials like SiC and small materials with high melting points. This new product goes on sale November 2014.
Back ground of this development
Power device materials such as SiC(GaN) are very expensive and therefore small amount of them are usually used for research and development of process device.
In the process of SiC(GaN), super high temperature range is necessary. Forming oxide films needs temperature of more than 1400 deg C. and activation annealing requires 1600 deg C. or more.
So ULVAC-RIKO has developed this desktop "High Temperature Rapid Thermal Annealing System HT-RTA59HD" that can easily get to the ultra-high temperature.
Features
- Capable of heating up to ultra-high temperature of 1800 deg C. in 10 seconds- Spot focused furnace with high-power lamps built on ellipsoidal reflective surface- Cold Wall enables rapid-heating & cooling and clean-heating- Desktop type with a heating furnace integrated with a quartz chamber- Easy input of temperature recipe through PC connected with USB- Capable of displaying temperature data on PC screen during the heating (Saving data in a text file is also available.)- One line of N2 gas flow meter available as a standard equipment
Purpose
- Oxide film formation in SiC(GaN) power device process, Research and development of activation annealing- Research and development of semiconductor process- Heat treatment of glass substrate, ceramics, composite materials etc.- Thermal shock tests of ceramics materials- Various heat treatment tests such as sintering of metal materials with high melting points- Usable as a temperature gradient furnace- Usable as a heating furnace for gas analysis
Specifications
- Temperature range: room temperature to 1800 deg C. (max.2000 deg C.)- Max. heating rate: approx.10 seconds to reach 1800 deg C. (When heated with non-control and full power)*This is an average rate between room temperature and 1800 deg C.- Atmosphere: N2 gas flow- Sample size: 15 mm square x 1 mm thickness- Temperature control sensor: JIS thermocouple type B (W-Re is also available)- Lamp rating: Infrared lamp AC 200 V 3.5 kW 2pcs- Standard security measures: disconnection of control thermocouple, over temperature of control thermocouple, abnormality of furnace surface temperature, decrease of pressure of lamp cooling gas
Utilities
- Power supply: AC 200 V 40 A 8 kW- System dimension: approx. 410 mm(W) x 450 mm(D) x 840mm(H) (without any protrusion)- System weight: approx. 45 kg
Fixed price: From JPY 6,500,000 yen
Sales plan for the first year: 20 units
Sales start: November, 2014
About ULVAC-RIKO, Inc.
ULVAC-RIKO, Inc. is an ULVAC group company that manufactures thermal analysis and thermo-physical property measuring systems, infrared gold image furnaces and applied instruments.
About ULVAC, Inc.
ULVAC, Inc., is a Japan-based vacuum equipment manufacturer. ULVAC was founded in 1952 and has contributed to development of industry and technology through comprehensive use of vacuum technology and its peripheral technology. We created "ULVAC SOLUTIONS" based on our one of a kind technologies built upon long years of research, development, and production technology innovations. We offer this solution composed of equipment, materials, analytic evaluation, vacuum components and other various services, for flat panel displays, solar cells, semiconductors, electronic components, and general industrial equipment. For more information, please visit www.ulvac.co.jp/eng/ .
Source: ULVAC, Inc.
Contact:
ULVAC-RIKO, Inc. Oversea sales department TEL: +81-45-931-2285 FAX: +81-45-933-9973 Website: http://ulvac-riko.co.jp/en/
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